发明名称 EQUIPMENT AND METHOD FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To inhibit the consumption of corpuscles and accurately control the range to be injected of corpuscles while realizing the equalization of the particle sizes of corpuscles, and to efficiently conduct a treatment. SOLUTION: A substrate washer 1 has a droplet generator generating the droplets of a washing liquid and an injection nozzle 4 injecting the droplets generated by the droplet generator towards a substrate 9. An external mixing type two fluid nozzle mixing the droplets supplied from the droplet generator together with a carrier gas and an accelerating gas supplied from an accelerating-gas supplier is used as the injection nozzle 4. In the injection nozzle 4, the consumption of the droplets is inhibited as the range to be injected of the droplets can be controlled accurately while realizing the equalization of the particle sizes of the droplets, by injecting the accelerating gas from the whole periphery of a droplet jet 463 and mixing the accelerating gas and the carrier gas as surrounding the peripheries of the carrier gas, and the substrate 9 can be washed efficiently. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006128332(A) 申请公布日期 2006.05.18
申请号 JP20040313326 申请日期 2004.10.28
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SATO MASANOBU
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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