| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a high-quality pattern form and a method for manufacturing it which provide only the objective area with high and fine liquid-repellent properties, in forming lyophilic and liquid-repellent patterns utilizing plasma irradiation. <P>SOLUTION: The method for manufacturing the pattern form is provided, which includes a plasma irradiation step for providing the liquid-repellent properties on a resin layer, by irradiating with plasma a patterning substrate having a base member, a photocatalyst containing layer including at least a photocatalyst formed on the base member, and the resin layer formed into the pattern on the photocatalyst containing layer and including at least the resin, using a fluorine compound, as the gas to be introduced. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
