METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE,申请号KR20040092267-传众专利搜索

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发明名称	METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	KR20060045206(A)	申请公布日期	2006.05.17
申请号	KR20040092267	申请日期	2004.11.12
申请人	SAMSUNG TECHWIN CO., LTD.	发明人	CHO, SE HOON;KIM, SE KWANG
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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