发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 In a method for manufacturing a semiconductor device by processing of a wafer level, in the case of forming the semiconductor device at the wafer level, on the basis of inspection results on individual semiconductor chips constituting a semiconductor wafer, a treatment for forming a circuit including a rewiring pattern is performed with respect to a semiconductor chip judged as a conforming product and a treatment in which a rewiring pattern is not formed in order to avoid having adverse influence on a semiconductor device of a conforming product or an inspection apparatus in an inspection of a formed semiconductor device after forming the semiconductor device is performed with respect to a semiconductor chip judged as a nonconforming product.
申请公布号 KR20060043142(A) 申请公布日期 2006.05.15
申请号 KR20050014996 申请日期 2005.02.23
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 ITO DAISUKE;KAWAHARA TOSHIMI
分类号 H01L21/66;H01L23/12 主分类号 H01L21/66
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