发明名称 LOW DIELECTRIC CONSTANT MATERIAL AND METHOD OF PROCESSING BY CVD
摘要 <p>Organofluorosilicate glass films contain both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species. Preferred films are represented by the formula SivOwCxHyFz, where v+w+x+y+z = 100%, v is from 10 to 35 atomic%, w is from 10 to 65 atomic% y is from 10 to 50 atomic%, x is from 1 to 30 atomic%, z is from 0.1 to 15 atomic%, and x/z is optionally greater than 0.25, wherein substantially none of the fluorine is bonded to the carbon.</p>
申请公布号 KR100577059(B1) 申请公布日期 2006.05.10
申请号 KR20030089944 申请日期 2003.12.11
申请人 发明人
分类号 C08G83/00;C03C3/04;C03C14/00;C23C16/30;C23C16/40;C23C16/42;H01B3/12;H01L21/31;H01L21/312;H01L21/316;H01L21/768;H01L23/522 主分类号 C08G83/00
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