发明名称 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device
摘要 The present invention provides a manufacturing method capable of obtaining minute structures. In order to achieve this, as shown in FIG. 1, a process target material ( 108 ) is exposed and the shape thereof is changed by relatively shifting a laser beam or electronic beam ( 101 ) against such process target material ( 108 ) and simultaneously repeating irradiation in an intermittent manner. Here, a plurality of minute convex or concave shapes are formed on the process target material ( 108 ) by employing a branching element ( 103 ) for branching a single beam ( 108 ) into a plurality of beams ( 106, 107 ); a parallel element ( 104 ) for converting said plurality of beams into beams which respectively advance in parallel; and a condensing element ( 105 ) for condensing the plurality of beams to the process target material ( 108 ) and generating a plurality of minute spots thereon.
申请公布号 US2006093964(A1) 申请公布日期 2006.05.04
申请号 US20050298656 申请日期 2005.12.12
申请人 SEIKO EPSON CORPORATION 发明人 NAGASAKA KIMIO;MIYAMAE AKIRA;KASEYA HIROYASU
分类号 G02B5/18;G03C5/00;G02B1/11;G03F1/08;G03F1/26;G03F1/68;G03F7/20 主分类号 G02B5/18
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