RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND

摘要

Disclosed is a resist composition containing a compound obtained by substituting a part or all of hydrogen atoms in the phenolic hydroxyl groups of a polyvalent phenolic compound (a) which has two or more phenolic hydroxyl groups and a molecular weight of 300-2500 with at least one group selected from the group consisting of acid-cleavable dissolution inhibiting groups represented by the general formulae (p1) or (p2) below (wherein R₁ and R₂ independently represent a branched or cyclic alkyl group which may contain a heteroatom, R₃ represents a hydrogen atom or a lower alkyl group, and n' represents an integer of 1-3).