发明名称 |
PROCESS FOR PRODUCTION OF SUBSTRATES HAVING WATER-REPELLENT HYDROPHILIC FILMS ON THE SURFACE |
摘要 |
<p>The invention provides a novel substrate which has a desired patterning and which has both a water-repellent area and a hydrophilic area; and a process for the production thereof which can dispense with special equipment or long-time irradiation with light. A process for the production of a substrate having a water-repellent hydrophilic film on the surface by conducting the following steps (1) to (3) successively: step (1) of forming on a substrate a surface on which hydrogen atoms bonded to silicon atoms are present, step (2) of reacting part of the hydrogen atoms bonded to silicon atoms with a water-repellent compound (B) which has both an unsaturated bond capable of being hydrosilylated and a water-repellent moiety through hydrosilylation in the presence of a hydrosilylation catalyst to introduce the water-repellent moiety to part of the surface and thus form a surface having a water-repellent area, and step (3) of converting at least part of the residual hydrogen atoms bonded to silicon atoms on the resulting surface into hydrophilic groups to introduce a hydrophilic area to the surface and thus form a surface having both a water-repellent area and a hydrophilic area.</p> |
申请公布号 |
WO2006046699(A1) |
申请公布日期 |
2006.05.04 |
申请号 |
WO2005JP19903 |
申请日期 |
2005.10.28 |
申请人 |
ASAHI GLASS COMPANY, LIMITED;FURUKAWA, YUTAKA |
发明人 |
FURUKAWA, YUTAKA |
分类号 |
C08L101/00;B05D7/24;C03C17/30;C08J7/12 |
主分类号 |
C08L101/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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