发明名称 DYE-CONTAINING RESIST COMPOSITIONS CONTAINING PHOTOACID GENERATORS AND COLOR FILTERS MADE BY USING THE SAME
摘要 <p>Color resist compositions which deal with the thickness reduction of color filters and which exhibit higher reproducibility of spectra even at higher dye concentrations, high heat resistance, high light resistance, and high resolution of 5µm or below and is free from residue, specifically, dye-containing resist compositions containing photoacid generators having structures represented by the general formula (1), preferably the general formula (2): (1) [wherein R&lt;SUP&gt;1&lt;/SUP&gt; is an organic group derived from a substituted or unsubstituted heterocyclic compound; and R&lt;SUP&gt;2&lt;/SUP&gt; is an organic group] (2) [wherein R&lt;SUP&gt;3&lt;/SUP&gt;, R&lt;SUP&gt;4&lt;/SUP&gt; and R&lt;SUP&gt;5&lt;/SUP&gt; are each independently hydrogen or an organic group; and R&lt;SUP&gt;2&lt;/SUP&gt; is an organic group].</p>
申请公布号 WO2006046398(A1) 申请公布日期 2006.05.04
申请号 WO2005JP18689 申请日期 2005.10.11
申请人 NISSAN CHEMICAL INDUSTRIES, LTD.;MAEDA, SEISUKE;YAMADA, MARIKO;HOSAKA, KAZUYOSHI;SUZUKI, MASAYOSHI 发明人 MAEDA, SEISUKE;YAMADA, MARIKO;HOSAKA, KAZUYOSHI;SUZUKI, MASAYOSHI
分类号 G03F7/004;C08F2/50;G02B5/20;G03F7/038 主分类号 G03F7/004
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