Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby

摘要

A method of correcting apodization in an optical system includes determining effects of apodization on an intensity distribution of a beam of radiation in a predetermined plane of the optical system; determining a more desirable intensity distribution of the beam of radiation in the predetermined plane such that apodization is corrected for; and absorbing portions of the beam of radiation in the predetermined plane as a function of location such that downstream from the predetermined plane the beam of radiation shows the more desirable intensity distribution. An optical component includes one or more absorbing layers designed to perform the absorption as a function of the location. The optical component may located in the pupil plane of the optical system.