| 摘要 |
A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame (700) defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. In an aspect, at least one edge (802a) of the frame has an opening (704) therethrough. A porous filtering material (702) fills each opening (704) through an edge of the frame. In another aspect, a plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
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