发明名称 Semiconductor device suited for a high frequency amplifier
摘要 According to the present invention, there is a provided a semiconductor device having, a collector contact layer made of an n-type GaAs layer; a first collector layer formed on the collector contact layer and made of an n-type GaAs layer; a second collector layer formed on the first collector layer and made of a p-type GaAs layer; a third collector layer formed on the second collector layer and made of an n-type InGaP layer; a fourth collector layer formed on the third collector layer and made of an n-type InGaP layer having an impurity concentration higher than that of the third collector layer; a fifth collector layer formed on the fourth collector layer and made of an n-type GaAs layer; a base layer formed on the fifth collector layer and made of a p-type GaAs layer; and an emitter layer formed on the base layer and made of an n-type InGaP layer.
申请公布号 US7038250(B2) 申请公布日期 2006.05.02
申请号 US20040834347 申请日期 2004.04.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SUGIYAMA TORU;NOZU TETSURO;MORIZUKA KOUHEI
分类号 H01L29/732;H01L29/08;H01L29/10;H01L29/205;H01L29/73;H01L29/737;H01L29/78;H01L31/0328;H01L31/0336;H01L31/072;H01L31/109 主分类号 H01L29/732
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