发明名称 POLYMERIZABLE COMPOUND, ITS PRODUCTION METHOD AND POLYMER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a polymer which simultaneously satisfies good optical transparency and alkali solubility, does not consume an acid produced through exposure and is useful as a resin for a photoresist, and a method for preparing a polymerizable compound without producing waste solution of a halide. <P>SOLUTION: The polymer has a structural unit derived from the polymerizable compound of formula (I) (wherein R<SP>1</SP>is a hydrogen atom or a methyl group; and R<SP>2</SP>is a protective group that is released by the action of an acid). The production method of the polymerizable compound involves a reaction of p-hydroxyethyl phenol and (meth)acrylic anhydride in the presence of an acid catalyst, a transesterification reaction between p-hydroxyethyl phenol and a (meth)acrylate and an esterification reaction between p-hydroxyethyl phenol and a (meth)acrylic acid. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006111803(A) 申请公布日期 2006.04.27
申请号 JP20040302701 申请日期 2004.10.18
申请人 SHOWA HIGHPOLYMER CO LTD 发明人 ENDO MITSUO;OGAWA KOSHI;FUJIKAWA YASUOKI
分类号 C08F20/30;C07B61/00;C07C67/03;C07C67/08;C07C69/54;C07C69/96 主分类号 C08F20/30
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