PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD

摘要

An immersion type projection optical system capable of replacing an immersed parallel flat plate with the laser resistance of a boundary lens kept at a sufficiently high level and without practically causing a decrease in imaging performance. The projection optical system comprises a first light transmitting member (Lp) disposed closest to a second plane (W) and a second light transmitting member (Lb) disposed adjacent to the first light transmitting member, wherein a light path between the first light transmitting member and the second plane is filled with a first liquid (Lm1) and a light path between the first light transmitting member and the second light transmitting member is filled with a second liquid (Lm2), and, when the center thickness of the first light transmitting member is D1, the center thickness of the first liquid layer is M1 and the center thickness of the second liquid layer is M2, the condition 1<D1/(M1+M2)<20 is satisfied.