发明名称 COMPOSITION FOR SURFACE HYDROPHOBIZING, SURFACE HYDROPHOBIZING METHOD, SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a composition for surface hydrophobizing of an insulating layer, which is used for an electronic device such as a semiconductor device, a surface hydrophobizing method, a semiconductor device and its manufacturing method. SOLUTION: The composition comprises a silane compound, e.g. 1,1,3,3-tetramethoxydisilacyclobutane, bis(dimethylmethoxysilyl)methane, 1,3-dimethoxy-1,1,3,3-tetramethyldisiloxane, etc. and an organic solvent. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006111738(A) 申请公布日期 2006.04.27
申请号 JP20040301070 申请日期 2004.10.15
申请人 JSR CORP 发明人 HATTORI SEITARO
分类号 C09K3/18;H01L21/768 主分类号 C09K3/18
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