摘要 |
PROBLEM TO BE SOLVED: To provide a light source device including a speckle and exhibiting a radiation intensity distribution suitable for a radiation pattern mask. SOLUTION: This light source device uses a semiconductor laser 1 having a small diffusion of emitted light and exhibiting a large speckle amount, and is applied to IrDA1.1. In that case, from the relationship of the speckle amount required in accordance with (maximum radiation intensity)/(minimum radiation intensity at a radiation angle between±Θ), and (maximum radiation intensity at a radiation angle outside±2Θ)/(minimum radiation intensity at a radiation angle between±Θ) as to IrDA1.1; and the directional half value angle/communication angle, the shape of an epoxy lens 6 is controlled so that it has a directional half value angle in accordance with the speckle amount. Thus, the light source device having the radiation intensity distribution suitable for the radiation pattern mask of IrDA1.1 at the minimum optical output can be obtained. COPYRIGHT: (C)2006,JPO&NCIPI
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