ALKALI METAL-FREE DETERGENT BEFORE PLATING

摘要

PROBLEM TO BE SOLVED: To provide an alkali metal-free alkali detergent used for cleaning for the purpose of uniformly applying plating to a semiconductor wafer or the like and for alkali cleaning for the purpose of improving its wettability. SOLUTION: The alkali metal-free detergent before plating comprises phosphoric acid or the salt thereof, and to which strong alkalinity of pH≥11.5 is imparted by the salt of tetraalkylammonium hydroxide. COPYRIGHT: (C)2006,JPO&NCIPI