发明名称 PROCESS FOR FABRICATING CRYSTAL OSCILLATOR
摘要 PROBLEM TO BE SOLVED: To prevent a metal film for regulating frequency from being scattered during fabrication process while sustaining the profile at the crystal wafer side end. SOLUTION: A multilayer film of a Cr film 6a and an Au film 6b is formed on the entire surface of a crystal wafer 5, and a resist pattern 10 is formed thereon in the profile of crystal piece. Since the resist pattern 10 is not formed at the crystal wafer 5 side end, the Cr film and Au film at that portion are removed by etching in subsequent process. A protective film 11 of photosensitive resin is formed at the crystal wafer 5 side end where the crystal wafer 5 is exposed by removing the Cr film 6a and the Au film 6b thus protecting the crystal wafer 5 side end in the subsequent etching process. A tuning fork crystal oscillator provided with an excitation electrode 3 and a metal film 4 for regulating frequency is then fabricated in accordance with conventional fabrication process. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006108825(A) 申请公布日期 2006.04.20
申请号 JP20040289448 申请日期 2004.09.30
申请人 CITIZEN MIYOTA CO LTD 发明人 KOITABASHI MASATOSHI
分类号 H03H3/02 主分类号 H03H3/02
代理机构 代理人
主权项
地址