| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus, in which uniform substrate treatment is enabled by eliminating stagnation of a treatment liquid inside a treatment tank, and further, facilitating easy removal of particles. SOLUTION: In the substrate treatment apparatus, comprising a treatment tank 1 which is surrounded on four sides by side walls 2b-2e and comprising a bottomed container of which the upper portion is open, and first and second feed nozzle pipes 10a-10d for feeding the treatment liquid into the treatment tank 1, each of the first and second feed nozzle pipes 10a-10d comprises a feed nozzle pipe including a plurality of spout holes 11 arrayed in one line at predetermined intervals on the lateral side of a hollow tubular body in the lengthwise direction. Among these feed nozzle pipes in the first feed nozzle pipe (10b, 10d), its spout holes are inclined obliquely downwardly, at a predetermined angle to a horizontal direction and in the second feed nozzle pipe (10a, 10c), and its spout holes are inclined obliquely upwardly, at a predetermined angle with respect to the horizontal direction and provided approximately horizontally at predetermined intervals on one sidewall 2b of the treatment tank 1. COPYRIGHT: (C)2006,JPO&NCIPI |
