发明名称 Deposition system
摘要 A vacuum deposition system comprises a vacuum vessel, an evaporation source holder provided in the vacuum vessel for holding an evaporation substance and a holding jig provided in the vacuum vessel for holding a substrate facing the evaporation source. An adhesion-prevention member is provided at outer peripheries of the evaporation source and the holding jig along an inner wall of the vacuum vessel across a region from a position facing a lateral part of the evaporation source holder to a position facing a lateral part of the holding jig. The adhesion-prevention member is spaced apart from the inner wall of the vacuum vessel. The adhesion-prevention member includes members slanted diagonally downward from the central part side toward the inner wall. Thereby, the adhesion-prevention member prevents an evaporant from the evaporation source from adhering to the inner wall of the vacuum vessel.
申请公布号 US2006081188(A1) 申请公布日期 2006.04.20
申请号 US20050107819 申请日期 2005.04.18
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 KOMORI HIDEKI;SUMIYOSHI MASAO;TANAKA TOSHIO;KAWASHIMA MIHARU
分类号 C23C16/00 主分类号 C23C16/00
代理机构 代理人
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