Verfahren und Vorrichtung zur Messung einer Schichtdicke

摘要

This invention relates to a method and a device for measuring minima or maxima of the thickness of a dielectric layer on electric conductor means having prominent portions, wherein a measuring head scans the surface of the layer and minima or maxima of the thickness of the dielectric layer are detected, stored and indicated. Several minima or maxima may simultaneously be indicated and compared with each other whereby it is possible to determine the general position of the conductor means in a dielectric and absolute extremum values of the thickness.