INTERFEROMETER SYSTEM FOR DISPLACEMENT MEASUREMENT, AND EXPOSURE DEVICE USING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an interferometer system for displacement measurement, and to provide an exposure device using this system.

SOLUTION: This interferometer comprises a light source for generating a light beam; a light dispenser for separating the light beam into a reference light beam and a light beam for a measurement; a standard mirror for changing a travelling direction of the reference light beam; a displacement transducer for changing the traveling direction of the light beam for the measurement and a detector for measuring the reference light beam and the light beam for the measurement which are changed of their traveling directions. A transmission-type grating or a reflection-type grating is used so as to convert the displacement, which is vertical to the traveling direction of the light beam for measurement into an optical path difference of the light beam for the measurement at the displacement transducer.

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