发明名称 |
PATTERN FORMING STRUCTURE, METHOD OF FORMING PATTERN, DEVICE AND ELECTRO-OPTICAL DEVICE, ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a bank structure which forms a flat region on the top surface of a region including a pattern by making heights of a fine pattern and other patterns the same at the time of forming the pattern, and to provide a method of forming the pattern, an electro-optical device and an electronic apparatus. SOLUTION: A barrier structure in which a protrusion 35 corresponding to the pattern formed of a functional liquid is provided includes a first recess 55 formed corresponding to the first pattern, a second recess 56 connected to the first pattern and formed corresponding to the second pattern narrower in width than the first pattern, and at least one or more projections 35 formed in the first recess 55. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006108148(A) |
申请公布日期 |
2006.04.20 |
申请号 |
JP20040288696 |
申请日期 |
2004.09.30 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HIRAI TOSHIMITSU;USHIYAMA TOSHIHIRO |
分类号 |
H01L21/3205;G02F1/1368;G09F9/00;H01L21/336;H01L23/52;H01L29/786;H01L51/50;H05B33/12;H05B33/22 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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