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发明名称
METHOD FOR FABRICATING METAL PATTERN OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20060032781(A)
申请公布日期
2006.04.18
申请号
KR20040081737
申请日期
2004.10.13
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
SHIN, CHUNG HWAN
分类号
H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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