发明名称 JUNCTION MATERIAL, SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF AND JOINING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a junction material and a semiconductor device wherein better mechanical strength is retained even on a high temperature condition, using a joining material not including lead substantially. <P>SOLUTION: In the junction material 4, a first metal joined material 1 and a second metal joined material 2 are joined, wherein the material 2 consists of a material or materials selected from a group composed of nickel, palladium, platinum and aluminum, and a solid solution phase including the constituent element of the second metal joined material and tin exists in the cross-sectional fine structure of a joined layer 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006100739(A) 申请公布日期 2006.04.13
申请号 JP20040287890 申请日期 2004.09.30
申请人 TOSHIBA CORP 发明人 TAKAHASHI TOSHIHIDE;KOMATSU SHUICHI;TADAUCHI KIMIHIRO;MATSUMOTO KAZUTAKA;KOMATSU IZURU
分类号 H01L21/52 主分类号 H01L21/52
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