发明名称 Memory devices and electronic systems comprising integrated bipolar and FET devices
摘要 The invention includes BIFETRAM devices. Such devices comprise a bipolar transistor in combination with a field effect transistor (FET) in a three-dimensional stacked configuration. The memory devices can be incorporated within semiconductor-on-insulator (SOI) constructions. The base region of the bipolar device can be physically and electrically connected to one of the source/drain regions of the FET to act as a storage node for the memory cell. The semiconductor material of the SOI constructions can comprise Si/Ge, and the active region of the FET can extend into the Si/Ge. The SOI constructions can be formed over any of a number of substrates, including, for example, semiconductive materials, glass, aluminum oxide, silicon dioxide, metals and/or plastics.
申请公布号 US7026690(B2) 申请公布日期 2006.04.11
申请号 US20030365947 申请日期 2003.02.12
申请人 MICRON TECHNOLOGY, INC. 发明人 BHATTACHARYYA ARUP
分类号 H01L29/76;H01L21/336;H01L21/8244;H01L21/84;H01L27/06;H01L27/11;H01L27/12;H01L29/73;H01L29/735;H01L29/737;H01L29/786;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L29/76
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