发明名称 METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY AND TFT SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display for reducing a manufacturing cost and for improving the productivity by reducing the number of photolithography processes. SOLUTION: The manufacturing method includes the steps of: forming a gate electrode and a gate pad by vapor-depositing first and second metallic films on a TFT part and a gate pad connection part and patterning those metallic films; forming an insulating film on the entire surface; forming first and second silicon film patterns on the insulating film of the TFT part, those patterns being formed so that the lower surface of the entire second amorphous silicon film abut against a first amorphous silicon film surface; forming source and drain electrodes on the TFT part and removing the second amorphous silicon film between the source and drain electrodes; forming a protective film so that portion of the drain electrode and gate pad are exposed and removing the insulating film on a portion of the gate part; and forming first and second pixel electrodes. The first metal film is the metallic film of one of Mo, Ta, and Ti and the second metal film is the metal film of Al or Al alloy. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006091918(A) 申请公布日期 2006.04.06
申请号 JP20050347737 申请日期 2005.12.01
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KWEON YEONG-CHAN
分类号 G02F1/1333;G02F1/1368;G02F1/1343;G02F1/1345;G02F1/136;G02F1/1362;H01L21/28;H01L21/3205;H01L21/336;H01L21/768;H01L21/77;H01L21/84;H01L23/52;H01L27/12;H01L29/423;H01L29/49;H01L29/786 主分类号 G02F1/1333
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