发明名称 Stelsel voor het chemisch/fysisch behandelen van een fluïdum.
摘要 <p>System for the chemical/physical treatment of a fluid in which a distributor valve has been installed for the feed/discharge of fluid to/from various reactors. The distributor valve consists of a plate valve with stationary plate and rotary plate. A cylindrical body provided with a number of axial bores that change into radial bores and emerge in the wall of a stationary housing adjoins the rotary plate and rotates therewith. A number of inlets/outlets located one after the other viewed in the axial direction are provided on the stationary housing. According to the invention the various radial bores in the cylindrical body are provided with a fluid via axial bores, based on a single valve plate.</p>
申请公布号 NL1027143(C2) 申请公布日期 2006.04.06
申请号 NL20041027143 申请日期 2004.09.30
申请人 SEPTOR TECHNOLOGIES B.V. 发明人 JOHANNES ALBERTUS EVERS
分类号 F16K11/074;(IPC1-7):F16K11/074 主分类号 F16K11/074
代理机构 代理人
主权项
地址