| 摘要 |
PROBLEM TO BE SOLVED: To provide a device exchanging a reactant gas discharge part without opening a vacuum treatment chamber to the atmosphere in a semiconductor device. SOLUTION: The vacuum treatment chamber 1 and a reactant gas supply part 6 are provided, and the reactant gas supply part 6 is constituted of a mixing part 2 and the reactant gas discharge part 3. Two or more sets of the reactant gas discharge parts 3 are stored in a vacuum chamber 16 connected to the vacuum treatment chamber 1. A carrying, fixing, holding and rotating mechanism for separating a used reactant gas discharge part 3 from the mixing part 2, then for recovering it and connecting a clean reactant gas discharge part 3 with the mixing part 2 inside the vacuum treatment chamber 1, is provided, and the reactant gas discharge part 3 is exchanged in a state of a vacuum degree of the vacuum treatment chamber 1 being maintained. Thus, a maintenance cycle is prolonged and the operation loss of the device is reduced. COPYRIGHT: (C)2006,JPO&NCIPI
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