发明名称 |
Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus |
摘要 |
A lithographic apparatus is disclosed. The apparatus includes a cleaning system for cleaning a component in the lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position.
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申请公布号 |
US2006072085(A1) |
申请公布日期 |
2006.04.06 |
申请号 |
US20040957754 |
申请日期 |
2004.10.05 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
COMPEN RENE THEODORUS P.;JEROEN JOOST |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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