| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive-type photosensitive composition and a pattern forming method that uses the photosensitive composition which are used in a manufacturing process for a semiconductor of an IC and the like, a manufacturing process for a liquid crystal circuit board, a thermal head and the like and another photofabrication processes, wherein exposure latitude, exposure latitude stability, and sensitivity and dissolution contrast at EUV (extreme-ultra violet) exposure are improved. <P>SOLUTION: The photosensitive composition contains (A1) a compound generating a specified alkane sulfonic acid, by irradiation with activated rays or radiation and (A2) a compound generating a specified acid, by irradiation it with activated rays or radiation. The photosensitive composition is used in the pattern forming method. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
