control system for compensating etch amount of semiconductor wafer,申请号KR20000017845-传众专利搜索

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发明名称	control system for compensating etch amount of semiconductor wafer
摘要
申请公布号	KR100567627(B1)	申请公布日期	2006.04.04
申请号	KR20000017845	申请日期	2000.04.06
申请人		发明人
分类号	H01L21/306	主分类号	H01L21/306
代理机构		代理人
主权项
地址

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