COMPOSITION FOR STRIPPING PHOTORESIST AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR ARRAY PANEL USING THE SAME

摘要

The present invention provides a photoresist stripper comprising about 5 wt% to about 20 wt% alcohol amine, about 40 wt% to about 70 wt% glycol ether, about 20 wt% to about 40 wt% N-methyl pyrrolidone, and about 0.2 wt% to about 6 wt% chelating agent.