发明名称 METHOD FOR ADJUSTING LIGHT IRRADIATION DEVICE, AND LIGHT IRRADIATION DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To solve a problem that the shape of a mask-processed light on the light incident surface of a work is distorted when applying the light, which is made by superposing the split-lights produced through a plurality of lens arrays, to a work through an aperture mask. <P>SOLUTION: The following steps are conducted: a dispersion state measuring step, where, after mask-processing of a mask-processed light L12 by an aperture mask 4, the dispersion state in a cross-sectional face direction of split-light components of the mask-processed light L12 is measured at an upstream side of the focal point by a condenser lens 5; and a lens position adjusting step, where, based on the measurement result of the dispersion state measuring step, positional adjustment is conducted by moving a lens array or an after-split condenser lens 3 in an optical axis direction, moving it in a direction perpendicular to the optical axis, or moving an after-mask-processing condenser lens 5 in the direction perpendicular to the optical axis. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006082107(A) 申请公布日期 2006.03.30
申请号 JP20040269077 申请日期 2004.09.16
申请人 RICOH CO LTD 发明人 KOBAYASHI TAKESHI;MIYAMOTO KAZUNORI;NAKAMURA SHOJI;TAKEMORI SATORU
分类号 B23K26/06;B23K26/02;G02B27/09 主分类号 B23K26/06
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