发明名称 MANUFACTURING METHOD OF LIQUID JET HEAD, LIQUID JET HEAD AND LIQUID JET DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for liquid jet head which well discharges liquid drops by unerringly preventing a defective discharge such as the blocking of nozzles by foreign matter, a liquid jet head and a liquid jet device. SOLUTION: The liquid jet head manufacturing method has the process of forming a piezoelectric element on one side of a channel forming substrate on one side of a channel forming substrate through a diaphragm and forming a through hole by removing a diaphragm of an area to be a communication section, the process of forming a lead electrode made up of a contact layer and a wiring metal layer and sealing a through hole by a discontinuous metal layer discontinuous from the lead electrode made up of the contact layer and the wiring metal layer, the process of joining a reservoir forming substrate to one side of the channel forming substrate, the process of forming a pressure generation chamber and a communication section by wet etching a channel forming substrate, the process of making the reservoir section communicate with the communication section by removing the discontinuous metal layer by wet etching the discontinuous metal layer and the process of forming a sealing metal layer by covering the end face of the contact layer and the wiring metal layer forming the discontinuous metal layer. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006082530(A) 申请公布日期 2006.03.30
申请号 JP20040272600 申请日期 2004.09.17
申请人 SEIKO EPSON CORP 发明人 TAKAHASHI TETSUJI;OTA MUTSUHIKO
分类号 B41J2/16;B41J2/045;B41J2/055 主分类号 B41J2/16
代理机构 代理人
主权项
地址
您可能感兴趣的专利