发明名称 MULTI-BEAM EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a multi-beam exposure device for recording an expression using an FM screen by using an two-dimensional optical modulator, increasing the number of exposable dots at once in a direction orthogonal to the scanning direction, and using a beam spot that has become rectangular by beam splitting. <P>SOLUTION: The multi-beam exposure device divides a plurality of exposure beam spots BS, projected to an exposure face so as to be arranged in parallel to the scanning direction from the two-dimensional optical modulator into a plurality of blocks G1, G2 and G3 in the scanning direction, is mutually shifted in the direction orthogonal to the scanning direction, and scans and exposes, in a state in which the exposure beam spot BS concerning at least one block G and the exposure beam spot BS concerning the other blocks G are shifted. Furthermore, the multi-beam exposure device scans and exposes an edge part by a steep beam spot BS by transmitting a plurality of optical beams in an optical element of a uniaxial crystal and distributing each optical beam with equal intensity in the form of a substantially rectangle at a focused point, as a normal beam and as an abnormal beam separated in a sub-scanning direction so as to partly overlap. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006085071(A) 申请公布日期 2006.03.30
申请号 JP20040272389 申请日期 2004.09.17
申请人 FUJI PHOTO FILM CO LTD 发明人 MIYAGAWA ICHIRO
分类号 G03F7/20 主分类号 G03F7/20
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