Device and process for anisotropic plasma etching of a substrate,in particular a silicon body,申请号GB20030024591-传众专利搜索

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发明名称	Device and process for anisotropic plasma etching of a substrate,in particular a silicon body
摘要
申请公布号	GB2396053(B)	申请公布日期	2006.03.29
申请号	GB20030024591	申请日期	2003.10.21
申请人	ROBERT BOSCH GMBH	发明人	KLAUS BREITSCHWERDT;BERND KUTSCH;FRANZ LAERMER
分类号	H01J37/32;H01L21/00	主分类号	H01J37/32
代理机构		代理人
主权项
地址

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