| 摘要 |
A method of writing an extended grating structure in a photosensitive waveguide comprising the steps of utilizing at least two overlapping beams of light to form an interference pattern, moving the waveguide through said overlapping beams, simultaneously controlling a relative phase delay between the beams utilising a phase modulator, thereby controlling the positions of maxima within said interference pattern to move at approximately the same velocity as the photosensitive waveguide, wherein the phase modulator does not comprise a mechanical means for effecting the phase modulation, and modifying the relative phase delay between the beams during the writing of the grating structure, whereby a deliberate detuning of the velocity of the positions of maxima within said interference pattern and the velocity of the photosensitive waveguide is utilized to vary a period of the written grating structure in the photosensitive waveguide.
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