发明名称 Material transfer method and manufacturing method for substrate for plasma display
摘要 The present invention provides a highly reliable technology for manufacturing a substrate with protrusions. After filling an UV-curable transfer material into the grooves of an intaglio plate for transfer, the UV-curable transfer material is cured by irradiating UV rays under the conditions where it is exposed to an atmosphere that contains at least one of oxygen and ozone while a curing-inhibited portion is formed in an area of the UV-curable transfer material exposed to this atmosphere, and the UV-curable transfer material is transferred to the substrate to form the protrusions, while the curing-inhibited portion is made to adhere to the substrate.
申请公布号 US7018771(B2) 申请公布日期 2006.03.28
申请号 US20050110784 申请日期 2005.04.21
申请人 ADVANCED PDP DEVELOPMENT CENTER CORPORATION 发明人 TOYODA OSAMU;INOUE KAZUNORI;TOKAI AKIRA
分类号 B41M1/10;H01J9/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/36 主分类号 B41M1/10
代理机构 代理人
主权项
地址