发明名称 High-energy ion implanter and method of operation thereof
摘要 A high-energy ion implanter monitors the recycling of a charge exchanging gas that is supplied to a stripper of a tandem accelerator. When the charge exchanging gas leaks out from the stripper and then flows into both energy boxes adjacent the tandem accelerator, gas sensors in the energy boxes measure the amount of the charge exchanging gas and send corresponding data to a controller. The controller compares the measured data with a standard data on the charge exchanging gas. When the measured data is different from the standard data, a pre-established interlocking system breaks off the operation of the implanter.
申请公布号 US7019316(B2) 申请公布日期 2006.03.28
申请号 US20040016246 申请日期 2004.12.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO YEON-HA
分类号 H01J37/317;H01L21/265 主分类号 H01J37/317
代理机构 代理人
主权项
地址