发明名称 |
Method and system to measure characteristics of a film disposed on a substrate |
摘要 |
The present invention is directed to providing a method and system to measure characteristics of a film disposed on a substrate. The method includes identifying a plurality of processing regions on the film; measuring characteristics of a subset of the plurality of processing regions, defining measured characteristics; determining a variation of one of the measured characteristics; and associating a cause of the variations based upon a comparison of the one of the measured characteristics to measured characteristics associated with the remaining processing regions of the subset. The system carries out the aforementioned method.
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申请公布号 |
US7019835(B2) |
申请公布日期 |
2006.03.28 |
申请号 |
US20040782187 |
申请日期 |
2004.02.19 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
MCMACKIN IAN M.;SCHUMAKER PHILLIP D.;CHOI BYUNG-JIN;SREENIVASAN SIDLGATA V.;WATTS MICHAEL P. C. |
分类号 |
G01B11/00;B81C1/00;B81C99/00;G01N21/84;G03F1/00;G03F7/00;G03F7/20 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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