Inspection device and inspection method of dielectric film, and method of manufacturing semiconductor device

摘要

After placing a sample in a heating vacuum chamber, a probe is climbed down to a position above a capacitor formed in the sample whose electrical characteristic is supposed to be measured. The probe is contacted with both electrodes of the capacitor, which is confirmed by electrical measurement. In order to measure capacitance loss, after filling N₂ gas up in the heating vacuum chamber, a mixed gas is introduced from a line for 3 vol % H₂+97 vol % N₂ to the inside of the heating vacuum chamber. After pressure has been stabilized there, capacitance loss and lapsed time are measured at the same time. Concentrations of residual H₂O and residual O₂ in the heating vacuum chamber are measured by a quadrupole mass spectrometer QMS; and at the same time, concentrations of each of residual H₂O and residual O₂ in an exhaust gas are measured by sensors.