发明名称 FOCUS/ASTIGMATISM CORRECTING ADJUSTING METHOD IN ELECTRON-BEAM EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To surely correct an astigmatism in the axial direction rotated at 45°from X and Y axes regarding a focus/astigmatism correcting adjusting method in an electron-beam exposure system. SOLUTION: The electron-beam exposure system has a focus adjusting mechanism using a knife-edge method and an astigmatism correcting mechanism. In the electron-beam exposure system using a knife-edge method measuring apparatus 2 as an absorption electronic signal detector, the astigmatism is corrected precedently by using an astigmatism corrector 6, and a focus adjustment is conducted using an object lens 4. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006080201(A) 申请公布日期 2006.03.23
申请号 JP20040260927 申请日期 2004.09.08
申请人 JEOL LTD 发明人 YAMAZAKI HITOTSUGU
分类号 H01L21/027;H01J37/153;H01J37/21;H01J37/305 主分类号 H01L21/027
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