发明名称 MANUFACTURING METHOD OF ELECTRO-OPTIC DEVICE AND INSPECTING METHOD OF CONTACT RESISTANCE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method and inspecting method of an electro-optic device capable of preventing the rise of contact resistance in the electro-optic device provided with a prescribed electric wiring structure and reducing display defects. <P>SOLUTION: The manufacturing method of the electro-optic device in an overlayer structure including a two-terminal type nonlinear element in a prescribed structure includes: the process of forming a pattern for inspections by successively laminating a first conductive layer composed of the same chrome layer as the two-terminal type nonlinear element, an inter-layer insulating film with a contact hole and a second conductive layer composed of the same conductive material as a pixel electrode electrically connected with the first conductive layer through the contact hole on a substrate; and the process of measuring the contact resistance between the first conductive layer and the second conductive layer in the pattern for the inspections and verifying the contact resistance between the two-terminal type nonlinear element and the pixel electrode. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006078819(A) 申请公布日期 2006.03.23
申请号 JP20040263361 申请日期 2004.09.10
申请人 SEIKO EPSON CORP 发明人 MINO YOICHI
分类号 G09F9/00;G01R31/02;G02F1/13;G02F1/1365;H01L49/02 主分类号 G09F9/00
代理机构 代理人
主权项
地址