SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR COMPONENT, AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of preventing a process liquid from flowing around the surface of a substrate to be processed and of easily maintaining the product quality of the substrate, and to provide a highly reliable semiconductor substrate, a semiconductor component, and a semiconductor device. SOLUTION: The substrate processing apparatus 100 for applying a process liquid to a substrate W has a substrate rotating part 101 for rotating the substrate W, and a shield 103 for shielding the substrate W from atmosphere. The substrate rotator 101 has a process liquid supplier 110 for supplying the process liquid to the surface facing the substrate rotator 101 of the substrate W, and a regulator 105 for regulating the relative motion of the substrate W with respect to the substrate rotator 101. The shield 103 has a gas supplier for discharging a gas between the substrate W and the shield 103, and a proximity for coming close to the entire periphery of the substrate. COPYRIGHT: (C)2006,JPO&NCIPI