发明名称 DEVICE FOR MANUFACTURING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To prevent falling of a base material being vacuum-adsorbed while maintaining easy exchangeability of the base material without causing increase in the number of components. SOLUTION: The device for manufacturing a substrate is provided with a base material 52 having a projected part 52b on a surface opposing to a dipping surface 52a, a base material receiving stage 50 in which one end of each suction hole 81 is opened in the surface engaging with the projected part 52b, and a vacuum adsorption mechanism 8 for vacuum-adsorbing the projected part 52b to the base material receiving stage 50 by exhausting a gas in the suction holes 81. The base material 52 is vacuum-adsorbed to the base material receiving stage 50 in such a state that the projected part 52b is engaged with a dovetail groove 50a of the base material receiving stage 50. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006076848(A) 申请公布日期 2006.03.23
申请号 JP20040264075 申请日期 2004.09.10
申请人 SHARP CORP 发明人 TADERA TAKAMITSU
分类号 C30B15/32;B22D23/04;C01B33/02;C30B29/06 主分类号 C30B15/32
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