发明名称 Precursors for film formation
摘要 A method including introducing a precursor in the presence of a circuit substrate, and forming a film including a reaction product of the precursor on the substrate, wherein the precursor includes a molecule comprising a primary species of the film and a modifier. A method including introducing a precursor in the presence of a circuit substrate, the precursor including a primary species and a film modifier as a single source, and forming a film on the circuit substrate. An apparatus including a semiconductor substrate, and a film on a surface of the semiconductor substrate, the film including a reaction product of a precursor including a molecule comprising a primary species and a modifier.
申请公布号 US2006063394(A1) 申请公布日期 2006.03.23
申请号 US20040947820 申请日期 2004.09.22
申请人 MCSWINEY MICHAEL L;LIOU HUEY-CHIANG;GOODNER MICHAEL D;LEET ROBERT E;MEAGLEY ROBERT P 发明人 MCSWINEY MICHAEL L.;LIOU HUEY-CHIANG;GOODNER MICHAEL D.;LEET ROBERT E.;MEAGLEY ROBERT P.
分类号 H01L21/31 主分类号 H01L21/31
代理机构 代理人
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