METHOD AND APPARATUS FOR TREATING SUBSTRATE

摘要

An apparatus for treating a substrate having a treating vessel (10) for the storage of a treating fluid and for the surface treatment of a substrate to be treated through the immersion in the fluid, a cleaning fluid supplying section (43) for the supply of a cleaning fluid to the treating vessel, a discharging section (44) for the discharge of a cleaning fluid from the treating vessel, and a drying gas supplying section for the supply of a drying gas to the treating vessel, wherein the discharging section has a variable valve (V