| 摘要 |
PROBLEM TO BE SOLVED: To provide a crystal oscillator for a thin film thickness monitor capable of highly accurately monitoring the thickness of a metallic thin film and having characteristics, especially, suitable for the automatic control of a deposition device. SOLUTION: The metallic thin film is deposited on the surface of the crystal oscillator for a thin film thickness monitor with the same condition as a workpiece. The thickness of the metallic thin film is monitored from the lowering of a resonant frequency caused by mass addition effects of the crystal oscillator. Exciting electrodes are formed on both-side plate faces of an AT-cut crystal piece subjected to planoconvex processing. The thin film thickness can be monitored from the change of the resonant frequency of thickness slip oscillation after the deposition of the metallic thin film on the exciting electrode. COPYRIGHT: (C)2006,JPO&NCIPI
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