| 摘要 |
<p>In order to remove a lot of silicon compounds in the PFC-containing exhaust gas , which flows into a catalyst type PFC decomposition processor, with a wet removal device in the preceding stage of a reactor, using the same method as before, a lot of water has been needed. It is intended to reduce the amount of water to be used. There is provided a gas decomposition processor, having: a wet removal device for removing solid substances contained in a processed gas; a preheating device for heating the processed gas; and a reactor for decomposing the processed gas, wherein the wet removal device has a plurality of spray nozzles, the plurality of spray nozzles including a spray nozzle (3) for forming a mist in the upstream side and a spray nozzle (2) for forming a water film in the downstream side. Different spray nozzles are arranged in the wet removal device to cause a water to be sprayed to contact efficiently with a processed gas containing a silicon compound. Moreover, a silicon compound-containing mist which is produced by reacting with the water is caused not to flow through the reactor having a catalyst layer.</p> |
